Pattern Formation through Instabilities in Thin Liquid Films:
From Fundamental Aspects to Applications

Workshop: September 21 - 28, 2004


Scientific Coordinators:

  • Alexander Nepomnyashchy (Technion Haifa, Israel)
  • Günter Reiter (Institut de Chimie des Surfaces et Interfaces Mulhouse, France)
  • Uwe Thiele (Max Planck Institute for the Physics of Complex Systems Dresden, Germany)


  • Katrin Lantsch (MPIPKS Dresden, Dresden, Germany)

    For further information contact: