Structural and electrical studies of metal-semiconductor system


In this poster i will present my research work which was worked by me during my Ph.D. I have worked on Fe/Si and Ti/Si samples. The structural studies were carried out by Grazing Incidence X-ray Diffraction (GIXRD) and X-ray Photoelectron Spectroscopy (XPS). The magnetic properties of Fe/Si system were carried out by Magnetic Optoelectric Kerr Effect (MOKE). The electrical studies of Fe/Si and Ti/Si systems were carried out using I-V curves, in which Schottky barrier height and Heat of Formation also calculated using that curves.

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